Eurmask New Half Mask

Eurmask Etna Half Mask is a half-mask designed for 2000 series filters that offer reliable protection from dust, organic or inorganic gases, acids, vapours, etc. The mask is constructed from TPE rubber and polypropylene. The Etna Half Mask is designed using Cad-Cam technology to fit well on any face, insulating against unwanted elements, while the straps help balance the half-mask to create comfort and ease of use. The features of the mask include a central silicon exhalation valve and two lateral quick-release snap filter connections, granting great field of vision and weight distribution.

Instructions and recommendations issued by the manufacturer:
The half-mask can be used together with the following 2000 series bayonet connection filters:
- 2002 P2 NR, 2003/D P3 R, 2001 A1, 2020 A2, 2004 ABEK1, 2031 A1P3 R, 2032 A2P3 R and 2034 ABEK1 P3 R.
- All gas filters are compatible with the P2 disk filter due to the COP2002 blocking cover.

Always make sure that the complete equipment is:
- Suitable for the current application;
- Fixed correctly;
- Worn throughout the exposure;
- Replaced when necessary.

Instructions for use:
- Installing filters is easy and secure through the bayonet connection system.
- Do not use it in environments where oxygen concentration falls below 17% volume.
- The mask must be stored between temperatures >-20°C and <+50°C, with <80% relative humidity.

Please be sure to read, understand, and follow the full Conditions, Disclaimer, and Directions for Use. Use the appropriate personal safety equipment if required and when needed.